This project investigates the effectiveness of D-wave’s quantum annealer to address the complex and computationally intensive problem of photomask optimization in optical microlithography. By leveraging the adiabatic annealing theorem, the project aims to quickly and accurately calculate photomask designs that produce wafer images closely matching the target design. The significance of this technology lies in its demonstration of the potential and development of applying quantum annealing to the inverse optimization of photomasks. Combining quantum annealing with classical steepest descent algorithms significantly reduces execution time and improves optimization quality. The advancement of this technology can foster the integration of quantum computing with the semiconductor industry, greatly accelerating the application and development of quantum technology.